Process Development for and Fabrication of APSM Set and Overlay Metrology Wafers

Solicitation description

GENERAL INFORMATION This is combined sources sought notice and notice of intent to sole source. The purpose of this so notice is to conduct market research and identify potential sources of commercial products/services that satisfy the Government’s anticipated needs. If no alternate sources are identified, as a result of this notice, the Government intends to issue a sole source award to AMAG CONSULTING, LLC, 221 FEATHERWOOD COURT, SCHENECTADY, NY 12303-5704 (UEI: EJTSRE9N1TM6), under the authority of FAR 13.106-1(b)(1)(i). NIST conducted market research from December 2025 through March 2026 by conducting internet searches; utilizing GSA and SAM.gov; reviewing professional journals and published literature; and speaking with colleagues, other professionals, and vendors to determine what sources could meet NIST’s minimum requirements. The results of that market research revealed that only AMAG CONSULTING, LLC, appears to be capable of meeting NIST’s requirements as they are the only vendor that creates attenuated phase shift masks. If other capable vendors are identified as a result of this notice, that information will be reviewed and considered so that the NIST may appropriately solicit for its requirement. The North American Industry Classification System (NAICS) code for this acquisition is 334413, Semiconductor and Related Device Manufacturing, with a Small Business Size Standard of 1,250 employees. This notice does not constitute a Request for Proposal (RFP), Request for Quotation (RFQ), Invitation for Bids (IFB), or any commitment by the Government to issue a solicitation or award a contract. The National Institute of Standards and Technology (NIST) will not pay for any information submitted in response to this notice. Submission of information is voluntary and will not result in any obligation on the part of the Government. NO SOLICITATION DOCUMENTS EXIST AT THIS TIME Requests for solicitation documents will not receive a response. Respondents shall clearly mark any proprietary or restricted information. In the absence of such markings, NIST will assume unlimited rights to all technical data submitted. BACKGROUND The National Institute of Standards and Technology (NIST) Physical Measurement Laboratory (PML), Microsystems and Nanotechnology Division (MND), CHIPS R&D Program (https://www.nist.gov/chips/metrology-community), as part of the CHIPS Act activities (Grand Challenge 5: Modeling and Simulating Semiconductor Manufacturing Processes), is working on developing imaging and measurement solutions for integrated circuit (IC) overlay metrology using a scanning electron microscope (SEM). IC production requires measuring the 3D size, shape, and placement of structures with atomic-level accuracy and consistency. The project, titled “SEM Overlay Metrology Based on Physics Model and Artificial Intelligence,” aims to establish a solid scientific foundation and develop comprehensive solutions for SEM-based overlay and dimensional metrology...

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Data this profile does NOT cover

• No likely incumbent surfaced; the solicitation number did not prefix-match any award in the FPDSAward window.