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Federal solicitation · S-133996 · back to recent

TECHNOLOGY LICENSING OPPORTUNITY: Electroplated Materials and Array Design for Scintillators

Agency
ENERGY, DEPARTMENT OF
Status
Closed
Response deadline
February 12, 2026
Posted
January 21, 2026
Set-aside
No set-aside (full and open competition)
NAICS
541715
Source
View on SAM.gov
Last checked
2026-09-12
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Solicitation description

Modern scintillator grids are essential to radiation detection systems that require high spatial resolution and fast response. However, current grid fabrication methods rely on hazardous chemical etching and produce inconsistent structures that limit performance, scalability, and safety. This capability addresses the limitations of current fabrication methods by eliminating hazardous chemical etching, improving uniformity, and enabling complex geometries at scale. Advantages Enables high-resolution grid fabrication from high-Z metals (e.g., Re, Au, Re/Ni) Avoids toxic and hazardous chemicals associated with traditional etching Supports scalable production of precision-aligned, high-Z scintillator arrays with low material loss Provides micron-level dimensional control and uniformity Compatible with multiple scintillator materials and array configurations, enabling customization for medical, industrial, and defense applications Adaptable to custom geometries for specialized imaging or detection applications Technology Description This technology enables the fabrication of dense, high-resolution scintillator grid arrays with micron-level precision, suitable for advanced radiation detection and imaging applications. The process works by electroplating high-Z metals, such as rhenium (Re), gold (Au), or their alloys, onto a substrate in the shape of the final grid geometry. These electro-formed components are then joined using hot isostatic pressing (HIP) at metal-specific temperatures and pressures to form solid bonded structures. Finally, the substrate is dissolved, leaving behind a free-standing, precision-aligned grid array. This approach eliminates chemical hazards, improves feature uniformity, and supports complex geometries, making it suitable for both small- and large-scale detector production. Market Applications This technology supports next-generation imaging and detection systems where high resolution, precision fabrication, and material efficiency are critical. This process can benefit: Fabricating CT, PET, and SPECT detector arrays for medical imaging Developing radiation detection systems for homeland security or military use Producing NDT imaging systems for aerospace and industrial inspection Supporting nuclear energy monitoring with compact, rugged detection grids Enabling advanced materials R&D for photonic and meta-material applications https://www.lanl.gov/engage/collaboration/feynman-center/tech-and-capability-search/electroplated-scintillators LANL Tech Partnerships: Unlock the Innovative Potential Los Alamos National Laboratory offers a wide range of cutting-edge technologies and capabilities that may provide your company with a competitive edge in the market and unlock the innovative potential that can enhance, refine, and revolutionize your products. LANL’s licensing program focuses on moving inventions developed by our researchers to commercial innovations. Patented and patent pending inventions and copyrighted software...

Vendor field in NAICS 541715 (12m)

Top 5 vendors by trailing-12m obligated dollars across this NAICS code, $2,640.7M total.

LOCKHEED MARTIN CORPORATION 19.4%
RAYTHEON COMPANY 18.5%
THE MITRE CORPORATION 13.4%
NORTHROP GRUMMAN SYSTEMS CORPORATION 11.6%
INTUITIVE RESEARCH AND TECHNOLOGY CORPORATION 9.6%

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Data this profile does not cover

  • No likely incumbent surfaced; the solicitation number did not match any award record in the trailing window.